We developed, in cooperation with leading manufacturers, a wide range
of optical thin-film metrology instruments from high-precision sophisticated
ellipsometry and reflectometry systems (spectroscopic, fast single wavelength
and Imaging) for research and production applications to low-budget
reflectometers for variety of applications.
Our TFCompanion data analysis software is the most sophisticated
and user-friendly application that supports reflectance, transmittance,
ellipsometry and imaging analysis.
The modular design of hardware and software enables to customize
and configure each system to specific application requirements without
additional cost, in most cases. Optical measurements are indirect.
Selection of measurement methods, system configuration to meet measurement
requirements are not trivial. We have extensive experience in using
thin-film measurement technique and we do rigorous quantitative simulation
of the system performance on specific application to reliably optimize
configuration and system specification requirements.
| System |
Description |
Characteristics |
| PicoProbe series |
A family of BME (photoelastic modulator based) ellipsometer systems:
SWEXY - single wavelength ellipsometer;
SEXY - spectroscopic ellipsometer
Supports TIRE, SPR and RDS mode of operation
|
Unparalleled precision and fast measurement for in-situ
and ex-situ applications.Full VASE capabilities.Up to 15 µm spot
|
| PicoScan series |
Imaging ellipsometer system That includes BAM, TIRE,
SPR, RDS support |
Versatile research system with spatial resolution
up to 1 µm.
Production system for full 200mm wafer imaging (ultra- dense
mapping)
|
| TR-Probe series |
Spectroscopic reflectometry and/or transmittance in
wide spectral range (VUV-NIR) |
High-precision systems (up to 0.01% precision). Custom
made special orders and OEM |
| M-Probe series |
Spectroscopic reflectometry and/or transmittance systems with
fiber optics probe.
Spectral range: 200-1700 nm
|
Easy to use, precise, low-cost systems.
Desktop and in-situ measurement.
Wide thickness range (100A-100 µm) |
Ellipsometry has more powerful measurement capabilities
as compared with Reflectometry or Transmittance:
- Simultaneous measurement of thickness and optical properties of
the filmstack layers;
- Sub-Angstrom sensitivity to thickness variations
- Measurement of inhomogeneous layers
PicoProbe series ellipsometers offer unparalleled
precision and reliability. In-situ and ex-situ, R&D lab and production
environment systems are available.
One limitation of the conventional ellipsometry is that measurement
is performed in one spot. Frequently, there is a need to "map"
the surface of the sample. Low density mapping does not present a problem
but in many cases of non-uniform samples a dense map is required. As
a mapping density requirements increase it is becoming impractical to
use conventional approach. Another limitation is a spatial resolution
of the measurement.
These problems are resolved by use of Imaging Ellipsometry that enables
simultaneous/parallel measurement of the surface area in ~2 million
points with resolution up to diffraction limit (~1um). The size of the
measured area depends on magnification/spatial resolution. One can measure
full 200mm wafer in few seconds with ~ 200um resolution.
PicoScan series Imaging system takes Imaging
ellipsometry on the new level - it is the first truly quantitative Imaging
ellipsometry.
However, Imaging Ellipsometry has its tradeoffs as well: spectroscopic
measurements can be taken only sequentially. It may be relatively slow
for production environment.
Spectral Reflectometry/transmittance is a more simple, fast and low
cost technique. It looks attractive for production-monitoring applications
that require dense mapping of the wafers and fast throughput or in-situ
deposition monitoring. Combining Reflectometry with Ellipsometry or
Reflectometry with Transmittance (in case of transparent substrates)
or both with Ellipsometry yield excellent result on many complex multilayer
applications. Oblique incidence polarized reflectance is another approach
that offer good tradeoff between measurement speed and performance.
TR-Probe series are custom made to most rigorous
specification requirement with repeatability up to 0.01% and wide spectral
range from 120nm-1700nm. TR-Probe systems are build on special requests
and for OEM customers.
The majority of application require simple, precise and low-cost system
that allows quick reflectance/transmittance measurement and analysis
of the thin film structure.
M-Probe series is a real workhorse in the R&D
lab and production environment. It is available in UV-IR range and can
be used in in-situ, ex-situ configuration. It is small, affordable,
easy to use and include everything for quick measurement and data analysis.